CLS-5000 is a compact 193 nm compact excimer laser. It is also available in different configurations with 248 nm and 308 nm wavelengths. It has an outstanding beam stability performance because of its extra features in positioning and pointing, which makes CLS-5000 a great solution for a number of different applications.
This short wavelength laser has a high repetition rate, which is very important for material ablation processes optical projection lithography using photomasks. Magnetic switch generator and built-in energy monitor make Optromix CLS-5000 very user-friendly and convenient.