CLS-5000Excimer Laser

CLS-5000Excimer Laser



Key Features:


  • Very high beam position stability
  • Very high beam pointing stability
  • High repetition rate
  • Magnetic switch generator
  • Compact excimer laser
  • Built-in Energy monitor
  • Energy stabilization
ArF KrF XeCl
Wavelength 193 nm 248 nm 308 nm
Max. Repetition Rate 500 Hz
Max. Pulse Energy 15 mJ 25 mJ 12 mJ
Energy Stability sigma < 2%
Beam Size (V x H) 6 mm x 3,5 mm 6 mm x 4 mm 6 mm x 4 mm
Beam Divergency (V x H) 2 mrad x 1 mrad
Pulse Duration 11 ns 12 ns 12 ns

Applications:


  • Spectroscopy
  • Manufacturing diffractive structures in fibers
  • Material processing
  • Micromarking
  • DUV Lithography

CLS-5000 is a compact 193 nm compact excimer laser. It is also available in different configurations with 248 nm and 308 nm wavelengths. It has an outstanding beam stability performance because of its extra features in positioning and pointing, which makes CLS-5000 a great solution for a number of different applications.

This short wavelength laser has a high repetition rate, which is very important for material ablation processes optical projection lithography using photomasks. Magnetic switch generator and built-in energy monitor make Optromix CLS-5000 very user-friendly and convenient.

CLS-5000Excimer Laser, 193 nm, Nominal Pulse Energy 15 mJ, Max Repetition Pulse 500 Hz Detailed Characteristics Ask for quotation
CLS-5000Excimer Laser, 248 nm, Nominal Pulse Energy 25 mJ, Max Repetition Pulse 500 Hz< Detailed Characteristics Ask for quotation
CLS-5000Excimer Laser, 308 nm, Nominal Pulse Energy 12 mJ, Max Repetition Pulse 500 Hz< Detailed Characteristics Ask for quotation

If you would like to buy CLS-5000Excimer Laser, please Contacts at: or +1 617 558 98 58